
CMP鍒剁▼宸ヨ壓鏉愭枡
鍖栧鏈烘鎶涘厜锛圕hemical Mechanical Polishing锛孋MP)鏄叏鐞冨叕璁ょ殑鍞竴鍙互瀹炵幇鍏ㄥ眬骞冲潶鍖栫殑鎶€鏈紝闆嗘垚鐢佃矾鍒堕€犱腑鏅跺渾鐨凜MP鍒剁▼涓昏鏈夋姏鍏夊灚锛圥ad)銆佹姏鍏夋恫锛圫lurry)銆佹竻娲楁恫锛圕hemical锛変笁澶ф牳蹇冩潗鏂欍€ 榧庨緳鑲′唤鎴愬姛寮€鍙戝嚭鑷富鐭ヨ瘑浜ф潈鐨凜MP鍒剁▼涓夊ぇ鏍稿績鏉愭枡鍒跺鍏抽敭鎶€鏈紝閲忎骇骞跺鍏ュ浗鍐呭嚑涔庢墍鏈夋櫠鍦嗕骇绾匡紝骞堕€愭杩涘叆绗笁浠e崐瀵间綋鍙婂ぇ纭呯墖浜х嚎锛屽疄鐜颁簡CMP鍒剁▼宸ヨ壓鏉愭枡鈥滀竴浣撳寲鈥濄€佲€滃畾鍒跺寲鈥濄€佲€滈珮閫傞厤鈥濄€佲€滃叏鍒剁▼鈥濈殑鍥戒骇鍖栥€侟/p>
楂樼KrF/ArF鏅跺渾鍏夊埢鑳舵潗鏂橖/p>
鏅跺渾鍏夊埢鑳舵槸鍗婂浣撳厜鍒诲埗绋嬩腑鏈€鍏抽敭鐨勬牳蹇冩潗鏂欍€傚湪鍏夊埢杩囩▼涓紝鍏夊埢鑳剁粡娑傝啘銆佸墠鐑樸€佹洕鍏夈€佸悗鐑樸€佹樉褰辩瓑姝ラ鍚庡彲灏嗙數璺浘褰㈢敱鎺╂ā鐗堣浆绉诲埌鍏夊埢鑳朵笂锛屽啀缁忓埢铓€宸ヨ壓瀹炵幇鐢佃矾鍥惧舰杞Щ鍒版櫠鍦嗭紙Wafer锛変笂銆傚厜鍒昏兌鏈韩鐨勬€ц兘鐩存帴鍐冲畾浜嗘渶缁堣兘鍦╓afer涓婂舰鎴愮殑鏈€灏忕嚎瀹藉拰鍥惧舰鐨勭簿搴︺€佷繚鐪熷害锛岄殢鐫€鑺墖鍒剁▼鑺傜偣涓嶆柇瀹界缉灏忥紝鍏夊埢鑳跺紑鍙戞妧鏈毦搴﹀ぇ骞呭鍔狅紝鏄欢缁懇灏斿畾寰嬬殑鍏抽敭涔嬩竴銆侟/p>